That and costs, DC high voltage is usually cheaper to do than
RF.....
On 19/08/2010 1:01 PM, Vladimir Chutko wrote:
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Hi Alfredo,
In general, the both are just different methods to supply
energy to
ionize a gas and support the gas discharge - plasma. When
you supply DC
(it may be both high voltage and low voltage with external
electrons
emitter), electrons accelerate in electrical field to get
energy which
is necessary to ionize a gas molecule, when you supply RF,
electrons are
accelerated in RF (usually 13.56 MHz) field. There also
may be MF
(middle frequency, 40 - 100 kHz) plasma. The each method
device design,
pros and cons strongly depend on your application.
Best regards,
Vladimir Chutko, Ph.D.
VECOR
101 Duranzo Aisle, Irvine, CA92606, USA
Phone: +1-949-394-4466
Fax: +1-949-451-6813
info@...
arainho_cl wrote:
> Hi All,
>
>
> Could some one eligthen me on the difference of using
HV DC and RF for plasma generation. What are the pro and
cons of each method.
>
> Thanks,
>
> Alfredo
>
>
>
> ------------------------------------
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