Hi Alfredo,
In general, the both are just different methods to supply energy to ionize a gas and support the gas discharge - plasma. When you supply DC (it may be both high voltage and low voltage with external electrons emitter), electrons accelerate in electrical field to get energy which is necessary to ionize a gas molecule, when you supply RF, electrons are accelerated in RF (usually 13.56 MHz) field. There also may be MF (middle frequency, 40 - 100 kHz) plasma. The each method device design, pros and cons strongly depend on your application.
Best regards,
Vladimir Chutko, Ph.D.
VECOR
101 Duranzo Aisle, Irvine, CA92606, USA
Phone: +1-949-394-4466
Fax: +1-949-451-6813
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www.vecorus.com
arainho_cl wrote:
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Hi All,
Could some one eligthen me on the difference of using HV DC and RF for plasma generation. What are the pro and cons of each method.
Thanks,
Alfredo
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