Hi Vladimir,
Thank's a lot!
These results are good enough!
I guess I stay at these IS parameters, because it works well.
Best Regards
Attila Schn¨¦
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--- In VacuumX@..., Vladimir Chutko <chutko@...> wrote:
Hi Attila,
The refraction index txt file is attached. Yes, It looks like your ion
source works well because the TiO2 refraction index is high enough,
congratulations!
It is very hard to give any recommendations regarding ion beam
parameters - the optimal parameters are different for different chambers
even with the same ion sources. I obtain optimal results for TiO2 at 180
V and 5 A discharge current, but my chamber is bigger than your one, I
use cryopump, my ion source works in O2 pressure range 7.5x10-5 - 1x10-4
torr. and distance between ion source and substrates is about 500 mm. I
use 150 V, 3 A only for SiO2 and for substrate pre-cleaning, for Al203,
TiO2, Ta2O5, ZrO2 I use 180V, 5A. Maybe it is not the best, but we
obtain good results and it is easy to set up for our technicians. So it
is very hard to compare, sorry. The best way is to try all possible
parameters.
Best regards and good luck!
Vladimir
On 8/29/2012 10:01 AM, Attila wrote:
Hi Vladimir,
Thank you very much indeed!
Well I did not find the attached txt.file. So what is the refractive index you calculated?
Well the thickness is could be real, because of the uniformity mask and the distance between the crystall and the substrate.So I can calulate the tooling now. I am very happy because my own built Ion Source works well.
Vladimir, what is your opinion about, the ion current density change. If I apply same IS power but lower Vd say 150V and higer Id say 3A. How affect this the ion current density, lower or higher or same?
Best Regards
Attila
--- In VacuumX@..., Vladimir Chutko <chutko@> wrote:
Hi Attila,
Please see attached files. The picture shows your data and spectra I've
designed for TiO2 film with Thk = 115.8 nm, deposited on one side of
BK7 glass 3 mm thickness. Calculated TiO2 refractive index dispersion
is in attached .txt file. The curves fit very good. We suppose that
absorption is zero, however below 400 nm TiO2 absorption strongly
increases, we usually do not work with TiO2 below 400 nm. Your TiO2 has
big enough refractive index because of ion beam assistance, it is good.
What do you think about these results?
Best regards,
Vladimir
On 8/11/2012 3:47 AM, Attila wrote:
Hi Vladimir,
Here are the datas I have:
The deposition rate was 2 Angstr?m/sec, I deposited 150nm of TIO2 at least the quartz monitor showed that.
That was an Ion beam assisted deposition. Substrate is about 300mm from the IS, parameters: Vd=240V Id=1,9A Iem(HF)=1,95A, O2 ions, not preheated substrate.
I have a uniformity mask over the Ebeam-gun, so it could be the deposited layer is somewhere around 100-120nm.
Thank's a lot!
BR.
Attila Schn¨¦
--- In VacuumX@..., Vladimir Chutko <chutko@> wrote:
Hi Attila,
Actually you have two unknown parameters - film thickness and refractive
index dispersion, so it is not easy to find thickness exactly just from
R or T spectra without some special software.
I'll try to help you. I have TiO2 films refractive index dispersion data
for TiO2 deposited on substrate heated up to 250C and TiO2 deposited on
cold or preheated substrate with ion beam assistance at 180 V, 5A O2
ions. I also have thin film coating software. Let me know how did you
deposit your film. It looks like your films are about 100 nm thickness.
What was the deposition time? What was the substrate temperature? Did
you use ion beam assistance and if you did, what were its parameters?
Best regards,
Vladimir Chutko
On 8/10/2012 6:42 AM, Attila wrote:
Hello,
Does anybody have the ability to calculate the TIO2 thin film layer thickness and refractive index, form spectrometer measurement datas?
I attached a folder and files to the files section.
Folder name: Thin film thickness. Where is two excel files. I did a transmittance measurement of a sample, where 150nm Thick Tio2 film was evaporated.
The substrate normal BK7 glass.
I can't compute the refractive index and the thickness from the datas because I don't know the methode, and the lack of knowledge.
I need this values for tooling factor calc.
Can anybody help me?
Thank's a lot!
Attila Schn¨¦
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