开云体育

ctrl + shift + ? for shortcuts
© 2025 Groups.io

O2 for thin film formation


Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
 

开云体育

Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the vacuum chamber after all the aluminizing is done so that a pure ALO3 coating can form for a few atoms thick ????? This would be after the high vac systems are all isolated and all the power is turned off ( right before I would normally open the chamber door ).? Maybe for 12 or 24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the formula is ???? I don’t like the idea of putting O2 in the chamber but if the vacuum is still pretty hard then there should not be a problem.?

Thanks

Andrew in soggy Florida


Anderson, Gordon \(Hovensa\)
 

开云体育

Hi Andrew,
I asked the same question in 2006 and got?this response from James Lerch:?

?

> I used O2 from my cutting torch once, didn't notice any difference.? After coating the mirror, I held the tip of the cutting torch in the opening for the vacuum relief?valve?and let a partial pressure of O2 back in.? The chamber pressure was perhaps at 30 torr or so..?? Maybe if I'd brought the chamber upto ATM pressure, it would have made a difference.. (shrug)

?
Also got this response from Thomas Janstrom:
?
> From: Thomas Janstrom
> To:
> Sent: Tuesday, November 21, 2006 9:39 PM
> Subject: RE: [VacuumX] O2 and AL
>
> I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so much
more reactive than cold O2 is. Just a thought...
>
> As a matter of habit I always run the plasma cycle after evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
>
I still have to build a chamber to try it out.?
?
You'd need a lot of O2 for your chamber unless the ionizer technique works at low concentration.? I considered using tubing into the chamber to direct the O2 across the mirrors surface to make it more effective.? How would you test?the density and uniformity of the coating?
?
Gordon Anderson
Senior I&E Specialist
?
?
?


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@...
Cc: SiTechservo@...
Subject: [VacuumX] O2 for thin film formation

Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the vacuum chamber after all the aluminizing is done so that a pure ALO3 coating can form for a few atoms thick ????? This would be after the high vac systems are all isolated and all the power is turned off ( right before I would normally open the chamber door ).? Maybe for 12 or 24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the formula is ???? I don’t like the idea of putting O2 in the chamber but if the vacuum is still pretty hard then there should not be a problem.?

Thanks

Andrew in soggy Florida


Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
 

开云体育

I was only planning on bringing the chamber back up to 1 torr or less from hard vacuum so there will not be a lot of O2 in the chamber.?
?
I just dont want to make a fuel / air bomb by doing someting stupid like turning on an ignition source ( plasma cleaning system ) in a pure O2 atmosphere.? I am not sure what partial pressure O2 becomes dangerous at.? I would presume?1 / 760 of an atmosphere simply cant sustain combustion?in any form but can react elementally with aluminum to form the coating.?
?
Now I wish I had not slept thru chemestry class.???
?
James, you out there to chime in on this ???
?
Thomas you out there to chime in on this ???????
?
Andrew in sunny Florida


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of Anderson, Gordon (Hovensa)
Sent: Friday, September 12, 2008 9:19 AM
To: VacuumX@...
Subject: RE: [VacuumX] O2 for thin film formation

Hi Andrew,
I asked the same question in 2006 and got?this response from James Lerch:?

?

> I used O2 from my cutting torch once, didn't notice any difference.? After coating the mirror, I held the tip of the cutting torch in the opening for the vacuum relief?valve?and let a partial pressure of O2 back in.? The chamber pressure was perhaps at 30 torr or so..?? Maybe if I'd brought the chamber upto ATM pressure, it would have made a difference.. (shrug)

?
Also got this response from Thomas Janstrom:
?
> From: Thomas Janstrom
> To:
> Sent: Tuesday, November 21, 2006 9:39 PM
> Subject: RE: [VacuumX] O2 and AL
>
> I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so much
more reactive than cold O2 is. Just a thought...
>
> As a matter of habit I always run the plasma cycle after evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
>
I still have to build a chamber to try it out.?
?
You'd need a lot of O2 for your chamber unless the ionizer technique works at low concentration.? I considered using tubing into the chamber to direct the O2 across the mirrors surface to make it more effective.? How would you test?the density and uniformity of the coating?
?
Gordon Anderson
Senior I&E Specialist
?
?
?


From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@yahoogroups.com
Cc: SiTechservo@yahoogroups.com
Subject: [VacuumX] O2 for thin film formation

Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the vacuum chamber after all the aluminizing is done so that a pure ALO3 coating can form for a few atoms thick ????? This would be after the high vac systems are all isolated and all the power is turned off ( right before I would normally open the chamber door ).? Maybe for 12 or 24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the formula is ???? I don’t like the idea of putting O2 in the chamber but if the vacuum is still pretty hard then there should not be a problem.?

Thanks

Andrew in soggy Florida


Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
 

开云体育

Oh,? before I forget again.........? I ran my chamber a few days ago and had the plasma cleaning system on for about?3 hours ( from 0.5 torr down to around 10-4 torr ) and created an amazing dark purple blue black?discoloration in the chamber.? I have made lots of discoloration but this was really dark, really purple and way more than it has ever done.??It is only on the metal parts of the chamber ( not the glass portholes ) so I am thinking it?has to do with the grounding path from the plasma cleaner ( purple hase of death ).? ??
?
What is that deep purple coating I am creating??????? It is now firmly "burned" onto my chamber walls everywhere.??Aluminum from the emitters has covered a lot of it but there are large sections of the chamber shielded from the evaporation cycle and they all have a new purple coating.??It will not?rub off like the deposited aluminum over it will.? It is really stuck on the chamber walls.??
?
Is this some kind of nitrogen + 7500 VAC discharge plasma byproduct ??????
?
Andrew ?


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of Anderson, Gordon (Hovensa)
Sent: Friday, September 12, 2008 9:19 AM
To: VacuumX@...
Subject: RE: [VacuumX] O2 for thin film formation

Hi Andrew,
I asked the same question in 2006 and got?this response from James Lerch:?

?

> I used O2 from my cutting torch once, didn't notice any difference.? After coating the mirror, I held the tip of the cutting torch in the opening for the vacuum relief?valve?and let a partial pressure of O2 back in.? The chamber pressure was perhaps at 30 torr or so..?? Maybe if I'd brought the chamber upto ATM pressure, it would have made a difference.. (shrug)

?
Also got this response from Thomas Janstrom:
?
> From: Thomas Janstrom
> To:
> Sent: Tuesday, November 21, 2006 9:39 PM
> Subject: RE: [VacuumX] O2 and AL
>
> I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so much
more reactive than cold O2 is. Just a thought...
>
> As a matter of habit I always run the plasma cycle after evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
>
I still have to build a chamber to try it out.?
?
You'd need a lot of O2 for your chamber unless the ionizer technique works at low concentration.? I considered using tubing into the chamber to direct the O2 across the mirrors surface to make it more effective.? How would you test?the density and uniformity of the coating?
?
Gordon Anderson
Senior I&E Specialist
?
?
?


From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@yahoogroups.com
Cc: SiTechservo@yahoogroups.com
Subject: [VacuumX] O2 for thin film formation

Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the vacuum chamber after all the aluminizing is done so that a pure ALO3 coating can form for a few atoms thick ????? This would be after the high vac systems are all isolated and all the power is turned off ( right before I would normally open the chamber door ).? Maybe for 12 or 24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the formula is ???? I don’t like the idea of putting O2 in the chamber but if the vacuum is still pretty hard then there should not be a problem.?

Thanks

Andrew in soggy Florida


 

开云体育

Andrew,

It's my understanding that aluminum forms a self protecting oxide nearly instantaneously upon exposure to oxygen.? Because the Al2O3 film is so hard and sticks so well to the metallic aluminum, it protects the pure metal from further oxidation.?

However, if you scratch the surface, then the exposed metal just oxidizes again, practically instantly.?

My bet is that it would make no appreciable difference whether you let pure O2 into the chamber, or just let the 21% O2 in the air hit the bare metal surface.

BTW, you can burn Al metal in air if you know the trick.? I used to get long curly aluminum drill cuttings, clamp the ends in heavy clip leads from a low voltage, high current AC transformer, apply current with a Variac till the shaving starts to sag, and then pull the shaving apart.? The broken ends would often burn white hot like strips of magnesium.? A neat demonstration!

Dave

Aurigema, Andrew N. (KSC)[ASRC AEROSPACE] wrote:

I was only planning on bringing the chamber back up to 1 torr or less from hard vacuum so there will not be a lot of O2 in the chamber.?
?
I just dont want to make a fuel / air bomb by doing someting stupid like turning on an ignition source ( plasma cleaning system ) in a pure O2 atmosphere.? I am not sure what partial pressure O2 becomes dangerous at.? I would presume?1 / 760 of an atmosphere simply cant sustain combustion?in any form but can react elementally with aluminum to form the coating.?
?
Now I wish I had not slept thru chemestry class.???
?
James, you out there to chime in on this ???
?
Thomas you out there to chime in on this ???????
?
Andrew in sunny Florida


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of Anderson, Gordon (Hovensa)
Sent: Friday, September 12, 2008 9:19 AM
To: VacuumX@...
Subject: RE: [VacuumX] O2 for thin film formation

Hi Andrew,
I asked the same question in 2006 and got?this response from James Lerch:?

?

> I used O2 from my cutting torch once, didn't notice any difference.? After coating the mirror, I held the tip of the cutting torch in the opening for the vacuum relief?valve?and let a partial pressure of O2 back in.? The chamber pressure was perhaps at 30 torr or so..?? Maybe if I'd brought the chamber upto ATM pressure, it would have made a difference.. (shrug)

?
Also got this response from Thomas Janstrom:
?
> From: Thomas Janstrom
> To:
> Sent: Tuesday, November 21, 2006 9:39 PM
> Subject: RE: [VacuumX] O2 and AL
>
> I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so much
more reactive than cold O2 is. Just a thought...
>
> As a matter of habit I always run the plasma cycle after evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
>
I still have to build a chamber to try it out.?
?
You'd need a lot of O2 for your chamber unless the ionizer technique works at low concentration.? I considered using tubing into the chamber to direct the O2 across the mirrors surface to make it more effective.? How would you test?the density and uniformity of the coating?
?
Gordon Anderson
Senior I&E Specialist
?
?
?


From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@yahoogroups.com
Cc: SiTechservo@yahoogroups.com
Subject: [VacuumX] O2 for thin film formation

Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the vacuum chamber after all the aluminizing is done so that a pure ALO3 coating can form for a few atoms thick ????? This would be after the high vac systems are all isolated and all the power is turned off ( right before I would normally open the chamber door ).? Maybe for 12 or 24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the formula is ???? I don’t like the idea of putting O2 in the chamber but if the vacuum is still pretty hard then there should not be a problem.?

Thanks

Andrew in soggy Florida


 

开云体育

my wife used a o2 compressor
?
it concentrated the o2 by filtering at 98 %
?
maybe that can help also?
just fill a balloon of O2 before open the chamber
?
jack 47'N 71'W
?


Hi Andrew,
I asked the same question in 2006 and got?this response from James Lerch:?

?

> I used O2 from my cutting torch once, didn't notice any difference.? After coating the mirror, I held the tip of the cutting torch in the opening for the vacuum relief?valve?and let a partial pressure of O2 back in.? The chamber pressure was perhaps at 30 torr or so..?? Maybe if I'd brought the chamber upto ATM pressure, it would have made a difference.. (shrug)

?
Also got this response from Thomas Janstrom:
?
> From: Thomas Janstrom
> To:
> Sent: Tuesday, November 21, 2006 9:39 PM
> Subject: RE: [VacuumX] O2 and AL
>
> I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so much
more reactive than cold O2 is. Just a thought...
>
> As a matter of habit I always run the plasma cycle after evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
>
I still have to build a chamber to try it out.?
?
You'd need a lot of O2 for your chamber unless the ionizer technique works at low concentration.? I considered using tubing into the chamber to direct the O2 across the mirrors surface to make it more effective.? How would you test?the density and uniformity of the coating?
?
Gordon Anderson
Senior I&E Specialist
?
?
?


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@...
Cc: SiTechservo@...
Subject: [VacuumX] O2 for thin film formation

Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the vacuum chamber after all the aluminizing is done so that a pure ALO3 coating can form for a few atoms thick ????? This would be after the high vac systems are all isolated and all the power is turned off ( right before I would normally open the chamber door ).? Maybe for 12 or 24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the formula is ???? I don’t like the idea of putting O2 in the chamber but if the vacuum is still pretty hard then there should not be a problem.?

Thanks

Andrew in soggy Florida


Anderson, Gordon \(Hovensa\)
 

开云体育

The thought is to produce a pure oxide layer without all the other impurities from earth's atmosphere mixed in such as?Water, Sulfur, etc...? A certain professional mirror coated uses ion assisted process with?pure O2.
?
Gordon Anderson x3239
Senior I&E Specialist
?
?
?


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of David Speck
Sent: Friday, September 12, 2008 5:56 PM
To: VacuumX@...
Subject: Re: [VacuumX] O2 for thin film formation

Andrew,

It's my understanding that aluminum forms a self protecting oxide nearly instantaneously upon exposure to oxygen.? Because the Al2O3 film is so hard and sticks so well to the metallic aluminum, it protects the pure metal from further oxidation.?

However, if you scratch the surface, then the exposed metal just oxidizes again, practically instantly.?

My bet is that it would make no appreciable difference whether you let pure O2 into the chamber, or just let the 21% O2 in the air hit the bare metal surface.

BTW, you can burn Al metal in air if you know the trick.? I used to get long curly aluminum drill cuttings, clamp the ends in heavy clip leads from a low voltage, high current AC transformer, apply current with a Variac till the shaving starts to sag, and then pull the shaving apart.? The broken ends would often burn white hot like strips of magnesium.? A neat demonstration!

Dave

Aurigema, Andrew N. (KSC)[ASRC AEROSPACE] wrote:

I was only planning on bringing the chamber back up to 1 torr or less from hard vacuum so there will not be a lot of O2 in the chamber.?
?
I just dont want to make a fuel / air bomb by doing someting stupid like turning on an ignition source ( plasma cleaning system ) in a pure O2 atmosphere.? I am not sure what partial pressure O2 becomes dangerous at.? I would presume?1 / 760 of an atmosphere simply cant sustain combustion?in any form but can react elementally with aluminum to form the coating.?
?
Now I wish I had not slept thru chemestry class.???
?
James, you out there to chime in on this ???
?
Thomas you out there to chime in on this ???????
?
Andrew in sunny Florida


From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On Behalf Of Anderson, Gordon (Hovensa)
Sent: Friday, September 12, 2008 9:19 AM
To: VacuumX@yahoogroups.com
Subject: RE: [VacuumX] O2 for thin film formation

Hi Andrew,
I asked the same question in 2006 and got?this response from James Lerch:?

?

> I used O2 from my cutting torch once, didn't notice any difference.? After coating the mirror, I held the tip of the cutting torch in the opening for the vacuum relief?valve?and let a partial pressure of O2 back in.? The chamber pressure was perhaps at 30 torr or so..?? Maybe if I'd brought the chamber upto ATM pressure, it would have made a difference.. (shrug)

?
Also got this response from Thomas Janstrom:
?
> From: Thomas Janstrom
> To:
> Sent: Tuesday, November 21, 2006 9:39 PM
> Subject: RE: [VacuumX] O2 and AL
>
> I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so much
more reactive than cold O2 is. Just a thought...
>
> As a matter of habit I always run the plasma cycle after evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
>
I still have to build a chamber to try it out.?
?
You'd need a lot of O2 for your chamber unless the ionizer technique works at low concentration.? I considered using tubing into the chamber to direct the O2 across the mirrors surface to make it more effective.? How would you test?the density and uniformity of the coating?
?
Gordon Anderson
Senior I&E Specialist
?
?
?


From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@yahoogroups.com
Cc: SiTechservo@yahoogroups.com
Subject: [VacuumX] O2 for thin film formation

Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the vacuum chamber after all the aluminizing is done so that a pure ALO3 coating can form for a few atoms thick ????? This would be after the high vac systems are all isolated and all the power is turned off ( right before I would normally open the chamber door ).? Maybe for 12 or 24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the formula is ???? I don’t like the idea of putting O2 in the chamber but if the vacuum is still pretty hard then there should not be a problem.?

Thanks

Andrew in soggy Florida


Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
 

开云体育

I was thinking of medical O2 so I dont have to make wet O2 or anything like that.? I was going to just put in a balloon's worth.? The question is to put on the high voltage or not ???
?
I am inclined to try it without first but dont see how 100% O2 is that different from 20% O2 from the normal back fill air.? Maybe it needs to have the high energy from the plasma cleaning system to make the chemestry work.? I just dont know.
?
Andrew in sunny Florida


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of jacques savard
Sent: Saturday, September 13, 2008 11:18 AM
To: VacuumX@...
Subject: Re: [VacuumX] O2 for thin film formation

my wife used a o2 compressor
?
it concentrated the o2 by filtering at 98 %
?
maybe that can help also?
just fill a balloon of O2 before open the chamber
?
jack 47'N 71'W
?


Hi Andrew,
I asked the same question in 2006 and got?this response from James Lerch:?

?

> I used O2 from my cutting torch once, didn't notice any difference.? After coating the mirror, I held the tip of the cutting torch in the opening for the vacuum relief?valve?and let a partial pressure of O2 back in.? The chamber pressure was perhaps at 30 torr or so..?? Maybe if I'd brought the chamber upto ATM pressure, it would have made a difference.. (shrug)

?
Also got this response from Thomas Janstrom:
?
> From: Thomas Janstrom
> To:
> Sent: Tuesday, November 21, 2006 9:39 PM
> Subject: RE: [VacuumX] O2 and AL
>
> I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so much
more reactive than cold O2 is. Just a thought...
>
> As a matter of habit I always run the plasma cycle after evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
>
I still have to build a chamber to try it out.?
?
You'd need a lot of O2 for your chamber unless the ionizer technique works at low concentration.? I considered using tubing into the chamber to direct the O2 across the mirrors surface to make it more effective.? How would you test?the density and uniformity of the coating?
?
Gordon Anderson
Senior I&E Specialist
?
?
?


From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@yahoogroups.com
Cc: SiTechservo@yahoogroups.com
Subject: [VacuumX] O2 for thin film formation

Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the vacuum chamber after all the aluminizing is done so that a pure ALO3 coating can form for a few atoms thick ????? This would be after the high vac systems are all isolated and all the power is turned off ( right before I would normally open the chamber door ).? Maybe for 12 or 24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the formula is ???? I don’t like the idea of putting O2 in the chamber but if the vacuum is still pretty hard then there should not be a problem.?

Thanks

Andrew in soggy Florida


 

Hi Andrew,

I wouldn't try anything near 100% pure oxygen. You never know what
might be lurking in your giant vacuum chamber. Any oil or other
substance (PVC) not usually flammable can burst into flame in a pure
oxygen environment. Especially when you are planning on using a
plasma discharge. BOOOOOM! They use PVC as the solid fuel in
hybrid rockets using nitrous oxide or pure oxygen as the oxidizer.
Also interesting is that some systems use high voltage discharge to
ignite the PVC/NOX mix. BOOOOM ZOOOOM!!

Also is wet oxygen a myth? I have heard that medical and welding
oxygen is no different. How could you have water vapor in a tank of
oxygen under high pressure and expect the metal of the tank to not
rapidly corrode? I have seen devices that bubble the oxygen through
water before patients breath it. Why would that be needed if it was
wet oxygen?

Roy M.






--- In VacuumX@..., "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" <andrew.n.aurigema@...> wrote:

I was thinking of medical O2 so I dont have to make wet O2 or
anything
like that. I was going to just put in a balloon's worth. The
question
is to put on the high voltage or not ???

I am inclined to try it without first but dont see how 100% O2 is
that
different from 20% O2 from the normal back fill air. Maybe it
needs to
have the high energy from the plasma cleaning system to make the
chemestry work. I just dont know.

Andrew in sunny Florida

________________________________

From: VacuumX@... [mailto:VacuumX@...] On
Behalf
Of jacques savard
Sent: Saturday, September 13, 2008 11:18 AM
To: VacuumX@...
Subject: Re: [VacuumX] O2 for thin film formation



my wife used a o2 compressor

it concentrated the o2 by filtering at 98 %

maybe that can help also
just fill a balloon of O2 before open the chamber

jack 47'N 71'W



Hi Andrew,
I asked the same question in 2006 and got this response from
James Lerch:


> I used O2 from my cutting torch once, didn't notice any
difference. After coating the mirror, I held the tip of the cutting
torch in the opening for the vacuum relief valve and let a partial
pressure of O2 back in. The chamber pressure was perhaps at 30
torr or
so.. Maybe if I'd brought the chamber upto ATM pressure, it would
have
made a difference.. (shrug)


Also got this response from Thomas Janstrom:

> From: Thomas Janstrom
> To: VacuumX@...
<
postID=2HCNBbnSaglQd2yAJQUJU
zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
> Sent: Tuesday, November 21, 2006 9:39 PM
> Subject: RE: [VacuumX] O2 and AL
>
> I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be
so much
more reactive than cold O2 is. Just a thought...
>
> As a matter of habit I always run the plasma cycle after
evaporating
the aluminum (prior to venting the chamber). I'll have to try
that
again with O2, but I'll have to back fill with O2, then pump
it
back
down again to get a decent Plasma going.
>

I still have to build a chamber to try it out.

You'd need a lot of O2 for your chamber unless the ionizer
technique works at low concentration. I considered using tubing
into
the chamber to direct the O2 across the mirrors surface to make it
more
effective. How would you test the density and uniformity of the
coating?

Gordon Anderson
Senior I&E Specialist




________________________________

From: VacuumX@... [mailto:VacuumX@...]
On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@...
Cc: SiTechservo@...
Subject: [VacuumX] O2 for thin film formation



Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into
the vacuum chamber after all the aluminizing is done so that a pure
ALO3
coating can form for a few atoms thick ??? This would be after the
high vac systems are all isolated and all the power is turned off (
right before I would normally open the chamber door ). Maybe for
12 or
24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what
the
formula is ??? I don't like the idea of putting O2 in the chamber
but
if the vacuum is still pretty hard then there should not be a
problem.

Thanks

Andrew in soggy Florida


 

PS I was thinking if your wife doesn't like the idea of a fusor she
really won't like the oxygen bomb you are thinking about.

Roy M.



--- In VacuumX@..., "radroy92" <rminnich@...> wrote:

Hi Andrew,

I wouldn't try anything near 100% pure oxygen. You never know
what
might be lurking in your giant vacuum chamber. Any oil or other
substance (PVC) not usually flammable can burst into flame in a
pure
oxygen environment. Especially when you are planning on using a
plasma discharge. BOOOOOM! They use PVC as the solid fuel in
hybrid rockets using nitrous oxide or pure oxygen as the oxidizer.
Also interesting is that some systems use high voltage discharge to
ignite the PVC/NOX mix. BOOOOM ZOOOOM!!

Also is wet oxygen a myth? I have heard that medical and welding
oxygen is no different. How could you have water vapor in a tank
of
oxygen under high pressure and expect the metal of the tank to not
rapidly corrode? I have seen devices that bubble the oxygen
through
water before patients breath it. Why would that be needed if it
was
wet oxygen?

Roy M.






--- In VacuumX@..., "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" <andrew.n.aurigema@> wrote:

I was thinking of medical O2 so I dont have to make wet O2 or
anything
like that. I was going to just put in a balloon's worth. The
question
is to put on the high voltage or not ???

I am inclined to try it without first but dont see how 100% O2 is
that
different from 20% O2 from the normal back fill air. Maybe it
needs to
have the high energy from the plasma cleaning system to make the
chemestry work. I just dont know.

Andrew in sunny Florida

________________________________

From: VacuumX@... [mailto:VacuumX@...] On
Behalf
Of jacques savard
Sent: Saturday, September 13, 2008 11:18 AM
To: VacuumX@...
Subject: Re: [VacuumX] O2 for thin film formation



my wife used a o2 compressor

it concentrated the o2 by filtering at 98 %

maybe that can help also
just fill a balloon of O2 before open the chamber

jack 47'N 71'W



Hi Andrew,
I asked the same question in 2006 and got this response from
James Lerch:


> I used O2 from my cutting torch once, didn't notice any
difference. After coating the mirror, I held the tip of the
cutting
torch in the opening for the vacuum relief valve and let a partial
pressure of O2 back in. The chamber pressure was perhaps at 30
torr or
so.. Maybe if I'd brought the chamber upto ATM pressure, it
would
have
made a difference.. (shrug)


Also got this response from Thomas Janstrom:

> From: Thomas Janstrom
> To: VacuumX@...
<
postID=2HCNBbnSaglQd2yAJQUJU
zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
> Sent: Tuesday, November 21, 2006 9:39 PM
> Subject: RE: [VacuumX] O2 and AL
>
> I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be
so much
more reactive than cold O2 is. Just a thought...
>
> As a matter of habit I always run the plasma cycle after
evaporating
the aluminum (prior to venting the chamber). I'll have to try
that
again with O2, but I'll have to back fill with O2, then pump
it
back
down again to get a decent Plasma going.
>

I still have to build a chamber to try it out.

You'd need a lot of O2 for your chamber unless the ionizer
technique works at low concentration. I considered using tubing
into
the chamber to direct the O2 across the mirrors surface to make
it
more
effective. How would you test the density and uniformity of the
coating?

Gordon Anderson
Senior I&E Specialist




________________________________

From: VacuumX@... [mailto:VacuumX@...]
On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@...
Cc: SiTechservo@...
Subject: [VacuumX] O2 for thin film formation



Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into
the vacuum chamber after all the aluminizing is done so that a
pure
ALO3
coating can form for a few atoms thick ??? This would be after
the
high vac systems are all isolated and all the power is turned off
(
right before I would normally open the chamber door ). Maybe for
12 or
24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what
the
formula is ??? I don't like the idea of putting O2 in the
chamber
but
if the vacuum is still pretty hard then there should not be a
problem.

Thanks

Andrew in soggy Florida


Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
 

开云体育

I was thinking of splitting water to make the O2 and that would have water vapor with it so it would be wet.? Medical O2 is dry.? Not sure if the welding stuff is really that pure.
?
From what I have discovered, at 1 mm of pressure ( absolute ) nothing will burn.? 100% O2?just sounds bad because at 760 mm ( 1 atm ) it would be a very very very?bad enviorment.?
?
Still wish somebody that actually knows about ion deposition would chime in.? ??


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of radroy92
Sent: Monday, September 15, 2008 3:42 PM
To: VacuumX@...
Subject: [VacuumX] Re: O2 for thin film formation

Hi Andrew,

I wouldn't try anything near 100% pure oxygen. You never know what
might be lurking in your giant vacuum chamber. Any oil or other
substance (PVC) not usually flammable can burst into flame in a pure
oxygen environment. Especially when you are planning on using a
plasma discharge. BOOOOOM! They use PVC as the solid fuel in
hybrid rockets using nitrous oxide or pure oxygen as the oxidizer.
Also interesting is that some systems use high voltage discharge to
ignite the PVC/NOX mix. BOOOOM ZOOOOM!!

Also is wet oxygen a myth? I have heard that medical and welding
oxygen is no different. How could you have water vapor in a tank of
oxygen under high pressure and expect the metal of the tank to not
rapidly corrode? I have seen devices that bubble the oxygen through
water before patients breath it. Why would that be needed if it was
wet oxygen?

Roy M.


--- In VacuumX@yahoogroups.com, "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" ...> wrote:
>
> I was thinking of medical O2 so I dont have to make wet O2 or
anything
> like that. I was going to just put in a balloon's worth. The
question
> is to put on the high voltage or not ???
>
> I am inclined to try it without first but dont see how 100% O2 is
that
> different from 20% O2 from the normal back fill air. Maybe it
needs to
> have the high energy from the plasma cleaning system to make the
> chemestry work. I just dont know.
>
> Andrew in sunny Florida
>
> ________________________________
>
> From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On
Behalf
> Of jacques savard
> Sent: Saturday, September 13, 2008 11:18 AM
> To: VacuumX@yahoogroups.com
> Subject: Re: [VacuumX] O2 for thin film formation
>
>
>
> my wife used a o2 compressor
>
> it concentrated the o2 by filtering at 98 %
>
> maybe that can help also
> just fill a balloon of O2 before open the chamber
>
> jack 47'N 71'W
>
>
>
> Hi Andrew,
> I asked the same question in 2006 and got this response from
> James Lerch:
>
>
> > I used O2 from my cutting torch once, didn't notice any
> difference. After coating the mirror, I held the tip of the cutting
> torch in the opening for the vacuum relief valve and let a partial
> pressure of O2 back in. The chamber pressure was perhaps at 30
torr or
> so.. Maybe if I'd brought the chamber upto ATM pressure, it would
have
> made a difference.. (shrug)
>
>
> Also got this response from Thomas Janstrom:
>
> > From: Thomas Janstrom
> > To: VacuumX@yahoogroups.com
> <
postID=2HCNBbnSaglQd2yAJQUJU
> zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
> > Sent: Tuesday, November 21, 2006 9:39 PM
> > Subject: RE: [VacuumX] O2 and AL
> >
> > I think firing up your plasma cleaning arc would make a BIG
> difference, this way the O2 would get ionised and therefore be
> so much
> more reactive than cold O2 is. Just a thought...
> >
> > As a matter of habit I always run the plasma cycle after
> evaporating
> the aluminum (prior to venting the chamber). I'll have to try
> that
> again with O2, but I'll have to back fill with O2, then pump
it
> back
> down again to get a decent Plasma going.
> >
>
> I still have to build a chamber to try it out.
>
> You'd need a lot of O2 for your chamber unless the ionizer
> technique works at low concentration. I considered using tubing
into
> the chamber to direct the O2 across the mirrors surface to make it
more
> effective. How would you test the density and uniformity of the
> coating?
>
> Gordon Anderson
> Senior I&E Specialist
>
>
>
>
> ________________________________
>
> From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com]
> On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
> Sent: Thursday, September 11, 2008 4:14 PM
> To: VacuumX@yahoogroups.com
> Cc: SiTechservo@yahoogroups.com
> Subject: [VacuumX] O2 for thin film formation
>
>
>
> Hey Guys,
>
> Has anybody heard of putting a puff of pure O2 ( oxygen ) into
> the vacuum chamber after all the aluminizing is done so that a pure
ALO3
> coating can form for a few atoms thick ??? This would be after the
> high vac systems are all isolated and all the power is turned off (
> right before I would normally open the chamber door ). Maybe for
12 or
> 24 hours of O2 soak ??????
>
> If you have, and this magic is real can you let me know what
the
> formula is ??? I don't like the idea of putting O2 in the chamber
but
> if the vacuum is still pretty hard then there should not be a
problem.
>
> Thanks
>
> Andrew in soggy Florida
>


 

Hi Andrew,

I did a Google search and I kept coming back to sputtering as the
cause of the colorful coatings that develope from use of the plasma
discharge cleaning system. What metal is used in your high voltage
feedthroughs? And the electrodes?

Roy M.

--- In VacuumX@..., "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" <andrew.n.aurigema@...> wrote:

Oh, before I forget again......... I ran my chamber a few days
ago and
had the plasma cleaning system on for about 3 hours ( from 0.5 torr
down
to around 10-4 torr ) and created an amazing dark purple blue black
discoloration in the chamber. I have made lots of discoloration but
this was really dark, really purple and way more than it has ever
done.
It is only on the metal parts of the chamber ( not the glass
portholes )
so I am thinking it has to do with the grounding path from the
plasma
cleaner ( purple hase of death ).

What is that deep purple coating I am creating ??? It is now
firmly
"burned" onto my chamber walls everywhere. Aluminum from the
emitters
has covered a lot of it but there are large sections of the chamber
shielded from the evaporation cycle and they all have a new purple
coating. It will not rub off like the deposited aluminum over it
will.
It is really stuck on the chamber walls.

Is this some kind of nitrogen + 7500 VAC discharge plasma byproduct
??????

Andrew

________________________________

From: VacuumX@... [mailto:VacuumX@...] On
Behalf
Of Anderson, Gordon (Hovensa)
Sent: Friday, September 12, 2008 9:19 AM
To: VacuumX@...
Subject: RE: [VacuumX] O2 for thin film formation



Hi Andrew,
I asked the same question in 2006 and got this response from James
Lerch:


I used O2 from my cutting torch once, didn't notice any
difference.
After coating the mirror, I held the tip of the cutting torch in the
opening for the vacuum relief valve and let a partial pressure of O2
back in. The chamber pressure was perhaps at 30 torr or so..
Maybe if
I'd brought the chamber upto ATM pressure, it would have made a
difference.. (shrug)


Also got this response from Thomas Janstrom:

From: Thomas Janstrom
To: VacuumX@...
<
postID=2HCNBbnSaglQd2yAJQUJU
zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
Sent: Tuesday, November 21, 2006 9:39 PM
Subject: RE: [VacuumX] O2 and AL

I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so
much
more reactive than cold O2 is. Just a thought...

As a matter of habit I always run the plasma cycle after
evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
I still have to build a chamber to try it out.

You'd need a lot of O2 for your chamber unless the ionizer technique
works at low concentration. I considered using tubing into the
chamber
to direct the O2 across the mirrors surface to make it more
effective.
How would you test the density and uniformity of the coating?

Gordon Anderson
Senior I&E Specialist




________________________________

From: VacuumX@... [mailto:VacuumX@...] On
Behalf
Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@...
Cc: SiTechservo@...
Subject: [VacuumX] O2 for thin film formation



Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the
vacuum chamber after all the aluminizing is done so that a pure ALO3
coating can form for a few atoms thick ??? This would be after the
high vac systems are all isolated and all the power is turned off (
right before I would normally open the chamber door ). Maybe for
12 or
24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the
formula
is ??? I don't like the idea of putting O2 in the chamber but if
the
vacuum is still pretty hard then there should not be a problem.

Thanks

Andrew in soggy Florida


Anderson, Gordon &#92;(Hovensa&#92;)
 

开云体育

Andrew,
Try this link:? ? They use O2 along with Ion assist.? They give a pretty good description of the process.? There is a link to an animation of the process on the right side of the page as well.?
?
Water molecules would split into Oxygen and Hydrogen.? So you'd need to separate them some how and then dry the oxygen.? If H2O molecules are present you may have issues with the coating.
?
?
?



From: VacuumX@... [mailto:VacuumX@...] On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Monday, September 15, 2008 4:13 PM
To: VacuumX@...
Subject: RE: [VacuumX] Re: O2 for thin film formation

I was thinking of splitting water to make the O2 and that would have water vapor with it so it would be wet.? Medical O2 is dry.? Not sure if the welding stuff is really that pure.
?
From what I have discovered, at 1 mm of pressure ( absolute ) nothing will burn.? 100% O2?just sounds bad because at 760 mm ( 1 atm ) it would be a very very very?bad enviorment.?
?
Still wish somebody that actually knows about ion deposition would chime in.? ??


From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On Behalf Of radroy92
Sent: Monday, September 15, 2008 3:42 PM
To: VacuumX@yahoogroups.com
Subject: [VacuumX] Re: O2 for thin film formation

Hi Andrew,

I wouldn't try anything near 100% pure oxygen. You never know what
might be lurking in your giant vacuum chamber. Any oil or other
substance (PVC) not usually flammable can burst into flame in a pure
oxygen environment. Especially when you are planning on using a
plasma discharge. BOOOOOM! They use PVC as the solid fuel in
hybrid rockets using nitrous oxide or pure oxygen as the oxidizer.
Also interesting is that some systems use high voltage discharge to
ignite the PVC/NOX mix. BOOOOM ZOOOOM!!

Also is wet oxygen a myth? I have heard that medical and welding
oxygen is no different. How could you have water vapor in a tank of
oxygen under high pressure and expect the metal of the tank to not
rapidly corrode? I have seen devices that bubble the oxygen through
water before patients breath it. Why would that be needed if it was
wet oxygen?

Roy M.

--- In VacuumX@yahoogroups.com, "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" ...> wrote:
>
> I was thinking of medical O2 so I dont have to make wet O2 or
anything
> like that. I was going to just put in a balloon's worth. The
question
> is to put on the high voltage or not ???
>
> I am inclined to try it without first but dont see how 100% O2 is
that
> different from 20% O2 from the normal back fill air. Maybe it
needs to
> have the high energy from the plasma cleaning system to make the
> chemestry work. I just dont know.
>
> Andrew in sunny Florida
>
> ________________________________
>
> From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On
Behalf
> Of jacques savard
> Sent: Saturday, September 13, 2008 11:18 AM
> To: VacuumX@yahoogroups.com
> Subject: Re: [VacuumX] O2 for thin film formation
>
>
>
> my wife used a o2 compressor
>
> it concentrated the o2 by filtering at 98 %
>
> maybe that can help also
> just fill a balloon of O2 before open the chamber
>
> jack 47'N 71'W
>
>
>
> Hi Andrew,
> I asked the same question in 2006 and got this response from
> James Lerch:
>
>
> > I used O2 from my cutting torch once, didn't notice any
> difference. After coating the mirror, I held the tip of the cutting
> torch in the opening for the vacuum relief valve and let a partial
> pressure of O2 back in. The chamber pressure was perhaps at 30
torr or
> so.. Maybe if I'd brought the chamber upto ATM pressure, it would
have
> made a difference.. (shrug)
>
>
> Also got this response from Thomas Janstrom:
>
> > From: Thomas Janstrom
> > To: VacuumX@yahoogroups.com
> <
postID=2HCNBbnSaglQd2yAJQUJU
> zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
> > Sent: Tuesday, November 21, 2006 9:39 PM
> > Subject: RE: [VacuumX] O2 and AL
> >
> > I think firing up your plasma cleaning arc would make a BIG
> difference, this way the O2 would get ionised and therefore be
> so much
> more reactive than cold O2 is. Just a thought...
> >
> > As a matter of habit I always run the plasma cycle after
> evaporating
> the aluminum (prior to venting the chamber). I'll have to try
> that
> again with O2, but I'll have to back fill with O2, then pump
it
> back
> down again to get a decent Plasma going.
> >
>
> I still have to build a chamber to try it out.
>
> You'd need a lot of O2 for your chamber unless the ionizer
> technique works at low concentration. I considered using tubing
into
> the chamber to direct the O2 across the mirrors surface to make it
more
> effective. How would you test the density and uniformity of the
> coating?
>
> Gordon Anderson
> Senior I&E Specialist
>
>
>
>
> ________________________________
>
> From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com]
> On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
> Sent: Thursday, September 11, 2008 4:14 PM
> To: VacuumX@yahoogroups.com
> Cc: SiTechservo@yahoogroups.com
> Subject: [VacuumX] O2 for thin film formation
>
>
>
> Hey Guys,
>
> Has anybody heard of putting a puff of pure O2 ( oxygen ) into
> the vacuum chamber after all the aluminizing is done so that a pure
ALO3
> coating can form for a few atoms thick ??? This would be after the
> high vac systems are all isolated and all the power is turned off (
> right before I would normally open the chamber door ). Maybe for
12 or
> 24 hours of O2 soak ??????
>
> If you have, and this magic is real can you let me know what
the
> formula is ??? I don't like the idea of putting O2 in the chamber
but
> if the vacuum is still pretty hard then there should not be a
problem.
>
> Thanks
>
> Andrew in soggy Florida
>


Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
 

开云体育

Roy,
?
I had not thought that the electrodes would be disolving.? The actual passthru is a carbon steel bolt with cad plating.? There is a cad plated nut at the end.? The "electrodes" are?nickel cromimum stainless steel ( .040" diameter )?safety wire.?
?
Is it possible that they are disolving slowly and depositing on the walls of the chamber ????
?
Maybe I should switch to aluminum electrodes????
?
Andrew


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of radroy92
Sent: Monday, September 15, 2008 4:17 PM
To: VacuumX@...
Subject: [VacuumX] Re: O2 for thin film formation

Hi Andrew,

I did a Google search and I kept coming back to sputtering as the
cause of the colorful coatings that develope from use of the plasma
discharge cleaning system. What metal is used in your high voltage
feedthroughs? And the electrodes?

Roy M.


--- In VacuumX@yahoogroups.com, "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" ...> wrote:
>
> Oh, before I forget again......... I ran my chamber a few days
ago and
> had the plasma cleaning system on for about 3 hours ( from 0.5 torr
down
> to around 10-4 torr ) and created an amazing dark purple blue black
> discoloration in the chamber. I have made lots of discoloration but
> this was really dark, really purple and way more than it has ever
done.
> It is only on the metal parts of the chamber ( not the glass
portholes )
> so I am thinking it has to do with the grounding path from the
plasma
> cleaner ( purple hase of death ).
>
> What is that deep purple coating I am creating ??? It is now
firmly
> "burned" onto my chamber walls everywhere. Aluminum from the
emitters
> has covered a lot of it but there are large sections of the chamber
> shielded from the evaporation cycle and they all have a new purple
> coating. It will not rub off like the deposited aluminum over it
will.
> It is really stuck on the chamber walls.
>
> Is this some kind of nitrogen + 7500 VAC discharge plasma byproduct
> ??????
>
> Andrew
>
> ________________________________
>
> From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On
Behalf
> Of Anderson, Gordon (Hovensa)
> Sent: Friday, September 12, 2008 9:19 AM
> To: VacuumX@yahoogroups.com
> Subject: RE: [VacuumX] O2 for thin film formation
>
>
>
> Hi Andrew,
> I asked the same question in 2006 and got this response from James
> Lerch:
>
>
> > I used O2 from my cutting torch once, didn't notice any
difference.
> After coating the mirror, I held the tip of the cutting torch in the
> opening for the vacuum relief valve and let a partial pressure of O2
> back in. The chamber pressure was perhaps at 30 torr or so..
Maybe if
> I'd brought the chamber upto ATM pressure, it would have made a
> difference.. (shrug)
>
>
> Also got this response from Thomas Janstrom:
>
> > From: Thomas Janstrom
> > To: VacuumX@yahoogroups.com
> <
postID=2HCNBbnSaglQd2yAJQUJU
> zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
> > Sent: Tuesday, November 21, 2006 9:39 PM
> > Subject: RE: [VacuumX] O2 and AL
> >
> > I think firing up your plasma cleaning arc would make a BIG
> difference, this way the O2 would get ionised and therefore be so
much
> more reactive than cold O2 is. Just a thought...
> >
> > As a matter of habit I always run the plasma cycle after
evaporating
> the aluminum (prior to venting the chamber). I'll have to try that
> again with O2, but I'll have to back fill with O2, then pump it back
> down again to get a decent Plasma going.
> >
>
> I still have to build a chamber to try it out.
>
> You'd need a lot of O2 for your chamber unless the ionizer technique
> works at low concentration. I considered using tubing into the
chamber
> to direct the O2 across the mirrors surface to make it more
effective.
> How would you test the density and uniformity of the coating?
>
> Gordon Anderson
> Senior I&E Specialist
>
>
>
>
> ________________________________
>
> From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On
Behalf
> Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
> Sent: Thursday, September 11, 2008 4:14 PM
> To: VacuumX@yahoogroups.com
> Cc: SiTechservo@yahoogroups.com
> Subject: [VacuumX] O2 for thin film formation
>
>
>
> Hey Guys,
>
> Has anybody heard of putting a puff of pure O2 ( oxygen ) into the
> vacuum chamber after all the aluminizing is done so that a pure ALO3
> coating can form for a few atoms thick ??? This would be after the
> high vac systems are all isolated and all the power is turned off (
> right before I would normally open the chamber door ). Maybe for
12 or
> 24 hours of O2 soak ??????
>
> If you have, and this magic is real can you let me know what the
formula
> is ??? I don't like the idea of putting O2 in the chamber but if
the
> vacuum is still pretty hard then there should not be a problem.
>
> Thanks
>
> Andrew in soggy Florida
>


 

Hi Andrew,



Sorry to come in on this so late, but I've been busy with non-vacuum things.
:-(



I would swap them out for 1/8" aluminium wire post haste! The heavier the
metal the harder the radiation it puts out when used for ion bombardment.
Just be thankful that you're not using tungsten! (Out put is in the soft
X-rays with 15KV potential applied or so I'm told.)



BTW on the pure O2 ion bombardment thing, if you put ~22L of gas at one atm
into a chamber your size the O2 partial pressure is going to be way too low
to sustain combustion, regardless of the energy your ion system puts into
the gas. But you don't need the ions to make the O2 work, Al is so reactive
that it would happen regardless anyway, this just speeds things up some.
This may also result in a more contiguous layer of AlO2 and thus better
protection of the metal coating (supposition on my part from not so recent
reading).



Cheers, Thomas Janstrom.

Little Gems.

www.tjlittlegems.com

-----Original Message-----
From: VacuumX@... [mailto:VacuumX@...] On Behalf Of
Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Tuesday, 16 September 2008 9:19 PM
To: VacuumX@...
Subject: RE: [VacuumX] Re: O2 for thin film formation



Roy,



I had not thought that the electrodes would be disolving. The actual
passthru is a carbon steel bolt with cad plating. There is a cad plated nut
at the end. The "electrodes" are nickel cromimum stainless steel ( .040"
diameter ) safety wire.



Is it possible that they are disolving slowly and depositing on the walls of
the chamber ????



Maybe I should switch to aluminum electrodes????



Andrew



_____

From: VacuumX@... [mailto:VacuumX@...] On Behalf Of
radroy92
Sent: Monday, September 15, 2008 4:17 PM
To: VacuumX@...
Subject: [VacuumX] Re: O2 for thin film formation

Hi Andrew,

I did a Google search and I kept coming back to sputtering as the
cause of the colorful coatings that develope from use of the plasma
discharge cleaning system. What metal is used in your high voltage
feedthroughs? And the electrodes?

Roy M.

--- In VacuumX@yahoogroups <mailto:VacuumX%40yahoogroups.com> .com,
"Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" <andrew.n.aurigema@...> wrote:

Oh, before I forget again......... I ran my chamber a few days
ago and
had the plasma cleaning system on for about 3 hours ( from 0.5 torr
down
to around 10-4 torr ) and created an amazing dark purple blue black
discoloration in the chamber. I have made lots of discoloration but
this was really dark, really purple and way more than it has ever
done.
It is only on the metal parts of the chamber ( not the glass
portholes )
so I am thinking it has to do with the grounding path from the
plasma
cleaner ( purple hase of death ).

What is that deep purple coating I am creating ??? It is now
firmly
"burned" onto my chamber walls everywhere. Aluminum from the
emitters
has covered a lot of it but there are large sections of the chamber
shielded from the evaporation cycle and they all have a new purple
coating. It will not rub off like the deposited aluminum over it
will.
It is really stuck on the chamber walls.

Is this some kind of nitrogen + 7500 VAC discharge plasma byproduct
??????

Andrew

________________________________

From: VacuumX@yahoogroups <mailto:VacuumX%40yahoogroups.com> .com
[mailto:VacuumX@yahoogroups <mailto:VacuumX%40yahoogroups.com> .com] On
Behalf
Of Anderson, Gordon (Hovensa)
Sent: Friday, September 12, 2008 9:19 AM
To: VacuumX@yahoogroups <mailto:VacuumX%40yahoogroups.com> .com
Subject: RE: [VacuumX] O2 for thin film formation



Hi Andrew,
I asked the same question in 2006 and got this response from James
Lerch:


I used O2 from my cutting torch once, didn't notice any
difference.
After coating the mirror, I held the tip of the cutting torch in the
opening for the vacuum relief valve and let a partial pressure of O2
back in. The chamber pressure was perhaps at 30 torr or so..
Maybe if
I'd brought the chamber upto ATM pressure, it would have made a
difference.. (shrug)


Also got this response from Thomas Janstrom:

From: Thomas Janstrom
To: VacuumX@yahoogroups <mailto:VacuumX%40yahoogroups.com> .com
<. <>
yahoo.com/group/VacuumX/post?
postID=2HCNBbnSaglQd2yAJQUJU
zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
Sent: Tuesday, November 21, 2006 9:39 PM
Subject: RE: [VacuumX] O2 and AL

I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so
much
more reactive than cold O2 is. Just a thought...

As a matter of habit I always run the plasma cycle after
evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
I still have to build a chamber to try it out.

You'd need a lot of O2 for your chamber unless the ionizer technique
works at low concentration. I considered using tubing into the
chamber
to direct the O2 across the mirrors surface to make it more
effective.
How would you test the density and uniformity of the coating?

Gordon Anderson
Senior I&E Specialist




________________________________

From: VacuumX@yahoogroups <mailto:VacuumX%40yahoogroups.com> .com
[mailto:VacuumX@yahoogroups <mailto:VacuumX%40yahoogroups.com> .com] On
Behalf
Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@yahoogroups <mailto:VacuumX%40yahoogroups.com> .com
Cc: SiTechservo@ <mailto:SiTechservo%40yahoogroups.com> yahoogroups.com
Subject: [VacuumX] O2 for thin film formation



Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the
vacuum chamber after all the aluminizing is done so that a pure ALO3
coating can form for a few atoms thick ??? This would be after the
high vac systems are all isolated and all the power is turned off (
right before I would normally open the chamber door ). Maybe for
12 or
24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the
formula
is ??? I don't like the idea of putting O2 in the chamber but if
the
vacuum is still pretty hard then there should not be a problem.

Thanks

Andrew in soggy Florida


John Dykins
 

Andrew,
I think that cadmium is not a good metal to have in a vacuum especially when heated/bombarded due to its outgassing.

John


Aurigema, Andrew N. (KSC)[ASRC AEROSPACE] wrote:

Roy,
I had not thought that the electrodes would be disolving. The actual passthru is a carbon steel bolt with cad plating. There is a cad plated nut at the end. The "electrodes" are nickel cromimum stainless steel ( .040" diameter ) safety wire. Is it possible that they are disolving slowly and depositing on the walls of the chamber ????
Maybe I should switch to aluminum electrodes????
Andrew

------------------------------------------------------------------------
*From:* VacuumX@... [mailto:VacuumX@...] *On Behalf Of *radroy92
*Sent:* Monday, September 15, 2008 4:17 PM
*To:* VacuumX@...
*Subject:* [VacuumX] Re: O2 for thin film formation

Hi Andrew,

I did a Google search and I kept coming back to sputtering as the
cause of the colorful coatings that develope from use of the plasma
discharge cleaning system. What metal is used in your high voltage
feedthroughs? And the electrodes?

Roy M.

--- In VacuumX@... <mailto:VacuumX%40yahoogroups.com>, "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" <andrew.n.aurigema@...> wrote:

Oh, before I forget again......... I ran my chamber a few days
ago and
had the plasma cleaning system on for about 3 hours ( from 0.5 torr
down
to around 10-4 torr ) and created an amazing dark purple blue black
discoloration in the chamber. I have made lots of discoloration but
this was really dark, really purple and way more than it has ever
done.
It is only on the metal parts of the chamber ( not the glass
portholes )
so I am thinking it has to do with the grounding path from the
plasma
cleaner ( purple hase of death ).

What is that deep purple coating I am creating ??? It is now
firmly
"burned" onto my chamber walls everywhere. Aluminum from the
emitters
has covered a lot of it but there are large sections of the chamber
shielded from the evaporation cycle and they all have a new purple
coating. It will not rub off like the deposited aluminum over it
will.
It is really stuck on the chamber walls.

Is this some kind of nitrogen + 7500 VAC discharge plasma byproduct
??????

Andrew

________________________________

From: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
[mailto:VacuumX@... <mailto:VacuumX%40yahoogroups.com>] On
Behalf
Of Anderson, Gordon (Hovensa)
Sent: Friday, September 12, 2008 9:19 AM
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
Subject: RE: [VacuumX] O2 for thin film formation



Hi Andrew,
I asked the same question in 2006 and got this response from James
Lerch:


I used O2 from my cutting torch once, didn't notice any
difference.
After coating the mirror, I held the tip of the cutting torch in the
opening for the vacuum relief valve and let a partial pressure of O2
back in. The chamber pressure was perhaps at 30 torr or so..
Maybe if
I'd brought the chamber upto ATM pressure, it would have made a
difference.. (shrug)


Also got this response from Thomas Janstrom:

From: Thomas Janstrom
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<
<>
postID=2HCNBbnSaglQd2yAJQUJU
zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
Sent: Tuesday, November 21, 2006 9:39 PM
Subject: RE: [VacuumX] O2 and AL

I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so
much
more reactive than cold O2 is. Just a thought...

As a matter of habit I always run the plasma cycle after
evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it back
down again to get a decent Plasma going.
I still have to build a chamber to try it out.

You'd need a lot of O2 for your chamber unless the ionizer technique
works at low concentration. I considered using tubing into the
chamber
to direct the O2 across the mirrors surface to make it more
effective.
How would you test the density and uniformity of the coating?

Gordon Anderson
Senior I&E Specialist




________________________________

From: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
[mailto:VacuumX@... <mailto:VacuumX%40yahoogroups.com>] On
Behalf
Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
Cc: SiTechservo@... <mailto:SiTechservo%40yahoogroups.com>
Subject: [VacuumX] O2 for thin film formation



Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the
vacuum chamber after all the aluminizing is done so that a pure ALO3
coating can form for a few atoms thick ??? This would be after the
high vac systems are all isolated and all the power is turned off (
right before I would normally open the chamber door ). Maybe for
12 or
24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the
formula
is ??? I don't like the idea of putting O2 in the chamber but if
the
vacuum is still pretty hard then there should not be a problem.

Thanks

Andrew in soggy Florida


Anderson, Gordon &#92;(Hovensa&#92;)
 

开云体育

Hi Thomas,
Would ion impingement smooth the micro surface of the aluminum oxide similar to electro polishing?
?
Thanks.
?
Gordon
?
?


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of Thomas Janstrom
Sent: Tuesday, September 16, 2008 7:49 AM
To: VacuumX@...
Subject: RE: [VacuumX] Re: O2 for thin film formation

Hi Andrew,

?

Sorry to come in on this so late, but I’ve been busy with non-vacuum things. L

?

I would swap them out for 1/8” aluminium wire post haste! The heavier the metal the harder the radiation it puts out when used for ion bombardment. Just be thankful that you’re not using tungsten! (Out put is in the soft X-rays with 15KV potential applied or so I’m told.)

?

BTW on the pure O2 ion bombardment thing, if you put ~22L of gas at one atm into a chamber your size the O2 partial pressure is going to be way too low to sustain combustion, regardless of the energy your ion system puts into the gas. But you don’t need the ions to make the O2 work, Al is so reactive that it would happen regardless anyway, this just speeds things up some. This may also result in a more contiguous layer of AlO2 and thus better protection of the metal coating (supposition on my part from not so recent reading).

?

Cheers, Thomas Janstrom.

Little Gems.

www.tjlittlegems.com

?

-----Original Message-----
From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On Behalf Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Tuesday, 16 September 2008 9:19 PM
To: VacuumX@yahoogroups.com
Subject: RE: [VacuumX] Re: O2 for thin film formation

?

Roy,

?

I had not thought that the electrodes would be disolving.? The actual passthru is a carbon steel bolt with cad plating.? There is a cad plated nut at the end.? The "electrodes" are?nickel cromimum stainless steel ( .040" diameter )?safety wire.?

?

Is it possible that they are disolving slowly and depositing on the walls of the chamber ????

?

Maybe I should switch to aluminum electrodes????

?

Andrew

?


From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On Behalf Of radroy92
Sent: Monday, September 15, 2008 4:17 PM
To: VacuumX@yahoogroups.com
Subject: [VacuumX] Re: O2 for thin film formation

Hi Andrew,

I did a Google search and I kept coming back to sputtering as the
cause of the colorful coatings that develope from use of the plasma
discharge cleaning system. What metal is used in your high voltage
feedthroughs? And the electrodes?

Roy M.


--- In VacuumX@yahoogroups.com, "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" ...> wrote:
>
> Oh, before I forget again......... I ran my chamber a few days
ago and
> had the plasma cleaning system on for about 3 hours ( from 0.5 torr
down
> to around 10-4 torr ) and created an amazing dark purple blue black
> discoloration in the chamber. I have made lots of discoloration but
> this was really dark, really purple and way more than it has ever
done.
> It is only on the metal parts of the chamber ( not the glass
portholes )
> so I am thinking it has to do with the grounding path from the
plasma
> cleaner ( purple hase of death ).
>
> What is that deep purple coating I am creating ??? It is now
firmly
> "burned" onto my chamber walls everywhere. Aluminum from the
emitters
> has covered a lot of it but there are large sections of the chamber
> shielded from the evaporation cycle and they all have a new purple
> coating. It will not rub off like the deposited aluminum over it
will.
> It is really stuck on the chamber walls.
>
> Is this some kind of nitrogen + 7500 VAC discharge plasma byproduct
> ??????
>
> Andrew
>
> ________________________________
>
> From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On
Behalf
> Of Anderson, Gordon (Hovensa)
> Sent: Friday, September 12, 2008 9:19 AM
> To: VacuumX@yahoogroups.com
> Subject: RE: [VacuumX] O2 for thin film formation
>
>
>
> Hi Andrew,
> I asked the same question in 2006 and got this response from James
> Lerch:
>
>
> > I used O2 from my cutting torch once, didn't notice any
difference.
> After coating the mirror, I held the tip of the cutting torch in the
> opening for the vacuum relief valve and let a partial pressure of O2
> back in. The chamber pressure was perhaps at 30 torr or so..
Maybe if
> I'd brought the chamber upto ATM pressure, it would have made a
> difference.. (shrug)
>
>
> Also got this response from Thomas Janstrom:
>
> > From: Thomas Janstrom
> > To: VacuumX@yahoogroups.com
> <
postID=2HCNBbnSaglQd2yAJQUJU
> zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
> > Sent: Tuesday, November 21, 2006 9:39 PM
> > Subject: RE: [VacuumX] O2 and AL
> >
> > I think firing up your plasma cleaning arc would make a BIG
> difference, this way the O2 would get ionised and therefore be so
much
> more reactive than cold O2 is. Just a thought...
> >
> > As a matter of habit I always run the plasma cycle after
evaporating
> the aluminum (prior to venting the chamber). I'll have to try that
> again with O2, but I'll have to back fill with O2, then pump it back
> down again to get a decent Plasma going.
> >
>
> I still have to build a chamber to try it out.
>
> You'd need a lot of O2 for your chamber unless the ionizer technique
> works at low concentration. I considered using tubing into the
chamber
> to direct the O2 across the mirrors surface to make it more
effective.
> How would you test the density and uniformity of the coating?
>
> Gordon Anderson
> Senior I&E Specialist
>
>
>
>
> ________________________________
>
> From: VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] On
Behalf
> Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
> Sent: Thursday, September 11, 2008 4:14 PM
> To: VacuumX@yahoogroups.com
> Cc: SiTechservo@yahoogroups.com
> Subject: [VacuumX] O2 for thin film formation
>
>
>
> Hey Guys,
>
> Has anybody heard of putting a puff of pure O2 ( oxygen ) into the
> vacuum chamber after all the aluminizing is done so that a pure ALO3
> coating can form for a few atoms thick ??? This would be after the
> high vac systems are all isolated and all the power is turned off (
> right before I would normally open the chamber door ). Maybe for
12 or
> 24 hours of O2 soak ??????
>
> If you have, and this magic is real can you let me know what the
formula
> is ??? I don't like the idea of putting O2 in the chamber but if
the
> vacuum is still pretty hard then there should not be a problem.
>
> Thanks
>
> Andrew in soggy Florida
>


Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
 

开云体育

I am beginning to think I chose poorly in my initital metal selection for high vacuum and high voltage.?
?
I can fix that.? It is only a 1/4" x 20 tpi bolt.? The new high voltage wiskers will be aluminum.
?
?


From: VacuumX@... [mailto:VacuumX@...] On Behalf Of John Dykins
Sent: Tuesday, September 16, 2008 9:11 AM
To: VacuumX@...
Subject: Re: [VacuumX] Re: O2 for thin film formation

Andrew,
I think that cadmium is not a good metal to have in a vacuum especially
when heated/bombarded due to its outgassing.

John

Aurigema, Andrew N. (KSC)[ASRC AEROSPACE] wrote:

> Roy,
>
> I had not thought that the electrodes would be disolving. The actual
> passthru is a carbon steel bolt with cad plating. There is a cad
> plated nut at the end. The "electrodes" are nickel cromimum stainless
> steel ( .040" diameter ) safety wire.
>
> Is it possible that they are disolving slowly and depositing on the
> walls of the chamber ????
>
> Maybe I should switch to aluminum electrodes????
>
> Andrew
>
> ----------------------------------------------------------
> *From:* VacuumX@yahoogroups.com [mailto:VacuumX@yahoogroups.com] *On
> Behalf Of *radroy92
> *Sent:* Monday, September 15, 2008 4:17 PM
> *To:* VacuumX@yahoogroups.com
> *Subject:* [VacuumX] Re: O2 for thin film formation
>
> Hi Andrew,
>
> I did a Google search and I kept coming back to sputtering as the
> cause of the colorful coatings that develope from use of the plasma
> discharge cleaning system. What metal is used in your high voltage
> feedthroughs? And the electrodes?
>
> Roy M.
>
> --- In VacuumX@yahoogroups.com 40yahoogroups.com>,
> "Aurigema, Andrew N. (KSC)[ASRC
> AEROSPACE]" ...> wrote:
> >
> > Oh, before I forget again......... I ran my chamber a few days
> ago and
> > had the plasma cleaning system on for about 3 hours ( from 0.5 torr
> down
> > to around 10-4 torr ) and created an amazing dark purple blue black
> > discoloration in the chamber. I have made lots of discoloration but
> > this was really dark, really purple and way more than it has ever
> done.
> > It is only on the metal parts of the chamber ( not the glass
> portholes )
> > so I am thinking it has to do with the grounding path from the
> plasma
> > cleaner ( purple hase of death ).
> >
> > What is that deep purple coating I am creating ??? It is now
> firmly
> > "burned" onto my chamber walls everywhere. Aluminum from the
> emitters
> > has covered a lot of it but there are large sections of the chamber
> > shielded from the evaporation cycle and they all have a new purple
> > coating. It will not rub off like the deposited aluminum over it
> will.
> > It is really stuck on the chamber walls.
> >
> > Is this some kind of nitrogen + 7500 VAC discharge plasma byproduct
> > ??????
> >
> > Andrew
> >
> > ________________________________
> >
> > From: VacuumX@yahoogroups.com 40yahoogroups.com>
> [mailto:VacuumX@yahoogroups.com 40yahoogroups.com>] On
> Behalf
> > Of Anderson, Gordon (Hovensa)
> > Sent: Friday, September 12, 2008 9:19 AM
> > To: VacuumX@yahoogroups.com 40yahoogroups.com>
> > Subject: RE: [VacuumX] O2 for thin film formation
> >
> >
> >
> > Hi Andrew,
> > I asked the same question in 2006 and got this response from James
> > Lerch:
> >
> >
> > > I used O2 from my cutting torch once, didn't notice any
> difference.
> > After coating the mirror, I held the tip of the cutting torch in the
> > opening for the vacuum relief valve and let a partial pressure of O2
> > back in. The chamber pressure was perhaps at 30 torr or so..
> Maybe if
> > I'd brought the chamber upto ATM pressure, it would have made a
> > difference.. (shrug)
> >
> >
> > Also got this response from Thomas Janstrom:
> >
> > > From: Thomas Janstrom
> > > To: VacuumX@yahoogroups.com 40yahoogroups.com>
> > <
> <>
> postID=2HCNBbnSaglQd2yAJQUJU
> > zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
> > > Sent: Tuesday, November 21, 2006 9:39 PM
> > > Subject: RE: [VacuumX] O2 and AL
> > >
> > > I think firing up your plasma cleaning arc would make a BIG
> > difference, this way the O2 would get ionised and therefore be so
> much
> > more reactive than cold O2 is. Just a thought...
> > >
> > > As a matter of habit I always run the plasma cycle after
> evaporating
> > the aluminum (prior to venting the chamber). I'll have to try that
> > again with O2, but I'll have to back fill with O2, then pump it back
> > down again to get a decent Plasma going.
> > >
> >
> > I still have to build a chamber to try it out.
> >
> > You'd need a lot of O2 for your chamber unless the ionizer technique
> > works at low concentration. I considered using tubing into the
> chamber
> > to direct the O2 across the mirrors surface to make it more
> effective.
> > How would you test the density and uniformity of the coating?
> >
> > Gordon Anderson
> > Senior I&E Specialist
> >
> >
> >
> >
> > ________________________________
> >
> > From: VacuumX@yahoogroups.com 40yahoogroups.com>
> [mailto:VacuumX@yahoogroups.com 40yahoogroups.com>] On
> Behalf
> > Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
> > Sent: Thursday, September 11, 2008 4:14 PM
> > To: VacuumX@yahoogroups.com 40yahoogroups.com>
> > Cc: SiTechservo@yahoogroups.com %40yahoogroups.com>
> > Subject: [VacuumX] O2 for thin film formation
> >
> >
> >
> > Hey Guys,
> >
> > Has anybody heard of putting a puff of pure O2 ( oxygen ) into the
> > vacuum chamber after all the aluminizing is done so that a pure ALO3
> > coating can form for a few atoms thick ??? This would be after the
> > high vac systems are all isolated and all the power is turned off (
> > right before I would normally open the chamber door ). Maybe for
> 12 or
> > 24 hours of O2 soak ??????
> >
> > If you have, and this magic is real can you let me know what the
> formula
> > is ??? I don't like the idea of putting O2 in the chamber but if
> the
> > vacuum is still pretty hard then there should not be a problem.
> >
> > Thanks
> >
> > Andrew in soggy Florida
> >
>
>


 

Hi Andrew,

I think you had at least one other reply about heavy metal high
voltage electrodes. Yes switch to aluminum. Very low sputtering and
no problems with X-rays. I also agree cadmium is not good in a
vacuum especially if it gets hot. You sure the nut is cadmium
plated? More likely it's zinc.

Roy M.



--- In VacuumX@..., "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" <andrew.n.aurigema@...> wrote:

Roy,

I had not thought that the electrodes would be disolving. The
actual
passthru is a carbon steel bolt with cad plating. There is a cad
plated
nut at the end. The "electrodes" are nickel cromimum stainless
steel (
.040" diameter ) safety wire.

Is it possible that they are disolving slowly and depositing on the
walls of the chamber ????

Maybe I should switch to aluminum electrodes????

Andrew

________________________________

From: VacuumX@... [mailto:VacuumX@...] On
Behalf
Of radroy92
Sent: Monday, September 15, 2008 4:17 PM
To: VacuumX@...
Subject: [VacuumX] Re: O2 for thin film formation



Hi Andrew,

I did a Google search and I kept coming back to sputtering as the
cause of the colorful coatings that develope from use of the plasma
discharge cleaning system. What metal is used in your high voltage
feedthroughs? And the electrodes?

Roy M.

--- In VacuumX@... <mailto:VacuumX%40yahoogroups.com> ,
"Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" <andrew.n.aurigema@> wrote:

Oh, before I forget again......... I ran my chamber a few days
ago and
had the plasma cleaning system on for about 3 hours ( from 0.5
torr
down
to around 10-4 torr ) and created an amazing dark purple blue
black
discoloration in the chamber. I have made lots of discoloration
but
this was really dark, really purple and way more than it has ever
done.
It is only on the metal parts of the chamber ( not the glass
portholes )
so I am thinking it has to do with the grounding path from the
plasma
cleaner ( purple hase of death ).

What is that deep purple coating I am creating ??? It is now
firmly
"burned" onto my chamber walls everywhere. Aluminum from the
emitters
has covered a lot of it but there are large sections of the
chamber
shielded from the evaporation cycle and they all have a new purple
coating. It will not rub off like the deposited aluminum over it
will.
It is really stuck on the chamber walls.

Is this some kind of nitrogen + 7500 VAC discharge plasma
byproduct
??????

Andrew

________________________________

From: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
[mailto:VacuumX@... <mailto:VacuumX%
40yahoogroups.com> ] On
Behalf
Of Anderson, Gordon (Hovensa)
Sent: Friday, September 12, 2008 9:19 AM
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
Subject: RE: [VacuumX] O2 for thin film formation



Hi Andrew,
I asked the same question in 2006 and got this response from James
Lerch:


I used O2 from my cutting torch once, didn't notice any
difference.
After coating the mirror, I held the tip of the cutting torch in
the
opening for the vacuum relief valve and let a partial pressure of
O2
back in. The chamber pressure was perhaps at 30 torr or so..
Maybe if
I'd brought the chamber upto ATM pressure, it would have made a
difference.. (shrug)


Also got this response from Thomas Janstrom:

From: Thomas Janstrom
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<
<>
postID=2HCNBbnSaglQd2yAJQUJU
zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
Sent: Tuesday, November 21, 2006 9:39 PM
Subject: RE: [VacuumX] O2 and AL

I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so
much
more reactive than cold O2 is. Just a thought...

As a matter of habit I always run the plasma cycle after
evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it
back
down again to get a decent Plasma going.
I still have to build a chamber to try it out.

You'd need a lot of O2 for your chamber unless the ionizer
technique
works at low concentration. I considered using tubing into the
chamber
to direct the O2 across the mirrors surface to make it more
effective.
How would you test the density and uniformity of the coating?

Gordon Anderson
Senior I&E Specialist




________________________________

From: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
[mailto:VacuumX@... <mailto:VacuumX%
40yahoogroups.com> ] On
Behalf
Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
Cc: SiTechservo@... <mailto:SiTechservo%
40yahoogroups.com>

Subject: [VacuumX] O2 for thin film formation



Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the
vacuum chamber after all the aluminizing is done so that a pure
ALO3
coating can form for a few atoms thick ??? This would be after the
high vac systems are all isolated and all the power is turned off
(
right before I would normally open the chamber door ). Maybe for
12 or
24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the
formula
is ??? I don't like the idea of putting O2 in the chamber but if
the
vacuum is still pretty hard then there should not be a problem.

Thanks

Andrew in soggy Florida


John Dykins
 

Andrew/Roy,

I think that zinc is as bad as cadmium

John


radroy92 wrote:

Hi Andrew,

I think you had at least one other reply about heavy metal high
voltage electrodes. Yes switch to aluminum. Very low sputtering and
no problems with X-rays. I also agree cadmium is not good in a
vacuum especially if it gets hot. You sure the nut is cadmium
plated? More likely it's zinc.

Roy M.

--- In VacuumX@... <mailto:VacuumX%40yahoogroups.com>, "Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" <andrew.n.aurigema@...> wrote:

Roy,

I had not thought that the electrodes would be disolving. The
actual
passthru is a carbon steel bolt with cad plating. There is a cad
plated
nut at the end. The "electrodes" are nickel cromimum stainless
steel (
.040" diameter ) safety wire.

Is it possible that they are disolving slowly and depositing on the
walls of the chamber ????

Maybe I should switch to aluminum electrodes????

Andrew

________________________________

From: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
[mailto:VacuumX@... <mailto:VacuumX%40yahoogroups.com>] On
Behalf
Of radroy92
Sent: Monday, September 15, 2008 4:17 PM
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
Subject: [VacuumX] Re: O2 for thin film formation



Hi Andrew,

I did a Google search and I kept coming back to sputtering as the
cause of the colorful coatings that develope from use of the plasma
discharge cleaning system. What metal is used in your high voltage
feedthroughs? And the electrodes?

Roy M.

--- In VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<mailto:VacuumX%40yahoogroups.com> ,
"Aurigema, Andrew N. (KSC)[ASRC
AEROSPACE]" <andrew.n.aurigema@> wrote:

Oh, before I forget again......... I ran my chamber a few days
ago and
had the plasma cleaning system on for about 3 hours ( from 0.5
torr
down
to around 10-4 torr ) and created an amazing dark purple blue
black
discoloration in the chamber. I have made lots of discoloration
but
this was really dark, really purple and way more than it has ever
done.
It is only on the metal parts of the chamber ( not the glass
portholes )
so I am thinking it has to do with the grounding path from the
plasma
cleaner ( purple hase of death ).

What is that deep purple coating I am creating ??? It is now
firmly
"burned" onto my chamber walls everywhere. Aluminum from the
emitters
has covered a lot of it but there are large sections of the
chamber
shielded from the evaporation cycle and they all have a new purple
coating. It will not rub off like the deposited aluminum over it
will.
It is really stuck on the chamber walls.

Is this some kind of nitrogen + 7500 VAC discharge plasma
byproduct
??????

Andrew

________________________________

From: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<mailto:VacuumX%40yahoogroups.com>
[mailto:VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<mailto:VacuumX%
40yahoogroups.com> ] On
Behalf
Of Anderson, Gordon (Hovensa)
Sent: Friday, September 12, 2008 9:19 AM
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<mailto:VacuumX%40yahoogroups.com>
Subject: RE: [VacuumX] O2 for thin film formation



Hi Andrew,
I asked the same question in 2006 and got this response from James
Lerch:


I used O2 from my cutting torch once, didn't notice any
difference.
After coating the mirror, I held the tip of the cutting torch in
the
opening for the vacuum relief valve and let a partial pressure of
O2
back in. The chamber pressure was perhaps at 30 torr or so..
Maybe if
I'd brought the chamber upto ATM pressure, it would have made a
difference.. (shrug)


Also got this response from Thomas Janstrom:

From: Thomas Janstrom
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<mailto:VacuumX%40yahoogroups.com>
<
<>
<
<>>
postID=2HCNBbnSaglQd2yAJQUJU
zg3fNZf5v0BlEc99ivDW__RkqgxQVqCDaSj1ZUv2xh96Y0ROhTZu_QYKdiIdWA>
Sent: Tuesday, November 21, 2006 9:39 PM
Subject: RE: [VacuumX] O2 and AL

I think firing up your plasma cleaning arc would make a BIG
difference, this way the O2 would get ionised and therefore be so
much
more reactive than cold O2 is. Just a thought...

As a matter of habit I always run the plasma cycle after
evaporating
the aluminum (prior to venting the chamber). I'll have to try that
again with O2, but I'll have to back fill with O2, then pump it
back
down again to get a decent Plasma going.
I still have to build a chamber to try it out.

You'd need a lot of O2 for your chamber unless the ionizer
technique
works at low concentration. I considered using tubing into the
chamber
to direct the O2 across the mirrors surface to make it more
effective.
How would you test the density and uniformity of the coating?

Gordon Anderson
Senior I&E Specialist




________________________________

From: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<mailto:VacuumX%40yahoogroups.com>
[mailto:VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<mailto:VacuumX%
40yahoogroups.com> ] On
Behalf
Of Aurigema, Andrew N. (KSC)[ASRC AEROSPACE]
Sent: Thursday, September 11, 2008 4:14 PM
To: VacuumX@... <mailto:VacuumX%40yahoogroups.com>
<mailto:VacuumX%40yahoogroups.com>
Cc: SiTechservo@...
<mailto:SiTechservo%40yahoogroups.com> <mailto:SiTechservo%
40yahoogroups.com>

Subject: [VacuumX] O2 for thin film formation



Hey Guys,

Has anybody heard of putting a puff of pure O2 ( oxygen ) into the
vacuum chamber after all the aluminizing is done so that a pure
ALO3
coating can form for a few atoms thick ??? This would be after the
high vac systems are all isolated and all the power is turned off
(
right before I would normally open the chamber door ). Maybe for
12 or
24 hours of O2 soak ??????

If you have, and this magic is real can you let me know what the
formula
is ??? I don't like the idea of putting O2 in the chamber but if
the
vacuum is still pretty hard then there should not be a problem.

Thanks

Andrew in soggy Florida